DE69805477T2 - Verfahren und Gerät zur Behandlung von verbrauchten Entwicklerflüssigkeiten - Google Patents

Verfahren und Gerät zur Behandlung von verbrauchten Entwicklerflüssigkeiten

Info

Publication number
DE69805477T2
DE69805477T2 DE69805477T DE69805477T DE69805477T2 DE 69805477 T2 DE69805477 T2 DE 69805477T2 DE 69805477 T DE69805477 T DE 69805477T DE 69805477 T DE69805477 T DE 69805477T DE 69805477 T2 DE69805477 T2 DE 69805477T2
Authority
DE
Germany
Prior art keywords
treating spent
spent developer
developer fluids
fluids
treating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69805477T
Other languages
English (en)
Other versions
DE69805477D1 (de
Inventor
Nobuo Ogawa
Tsutomu Kojima
Andre Dheur
Shin Ashizuka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Asahi Kasei Chemicals Corp
Asahi Chemical Industry Co Ltd
Original Assignee
Asahi Kasei Chemicals Corp
Asahi Chemical Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Kasei Chemicals Corp, Asahi Chemical Industry Co Ltd filed Critical Asahi Kasei Chemicals Corp
Publication of DE69805477D1 publication Critical patent/DE69805477D1/de
Application granted granted Critical
Publication of DE69805477T2 publication Critical patent/DE69805477T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3092—Recovery of material; Waste processing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
DE69805477T 1997-08-14 1998-08-12 Verfahren und Gerät zur Behandlung von verbrauchten Entwicklerflüssigkeiten Expired - Lifetime DE69805477T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP21941397 1997-08-14
JP22053897 1997-08-15

Publications (2)

Publication Number Publication Date
DE69805477D1 DE69805477D1 (de) 2002-06-27
DE69805477T2 true DE69805477T2 (de) 2003-02-13

Family

ID=26523104

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69805477T Expired - Lifetime DE69805477T2 (de) 1997-08-14 1998-08-12 Verfahren und Gerät zur Behandlung von verbrauchten Entwicklerflüssigkeiten

Country Status (4)

Country Link
US (2) US6153107A (de)
EP (1) EP0897135B1 (de)
AU (1) AU705780B2 (de)
DE (1) DE69805477T2 (de)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6855487B2 (en) * 2001-10-26 2005-02-15 Kodak Polychrome Graphics, Llc Method and apparatus for refreshment and reuse of loaded developer
US6759185B2 (en) 2001-11-14 2004-07-06 Kodak Polychrome Graphics Llc Method for reuse of loaded developer
US6908558B2 (en) * 2003-03-19 2005-06-21 David J. Stinson Fountain solution recycling system for commercial printers
JP5071122B2 (ja) * 2008-01-24 2012-11-14 セイコーエプソン株式会社 廃液処理装置及び液体噴射装置
JP2009184133A (ja) * 2008-02-04 2009-08-20 Seiko Epson Corp 廃液処理装置
JP2009202389A (ja) * 2008-02-27 2009-09-10 Seiko Epson Corp 廃液処理装置
DK2851399T3 (da) * 2009-09-29 2017-11-27 Covalon Tech Inc System og fremgangsmåde til coating af medicinsk apparatur
US8721781B2 (en) 2011-03-11 2014-05-13 Seiko Epson Corporation Ink composition

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5394261A (en) * 1977-01-30 1978-08-18 Matsuba Kougiyou Kk Method and equipment for treating waste effluent of photosensitive resin
JPS5451253A (en) * 1977-09-29 1979-04-21 Unitika Ltd Method of treating developing waste liquor of sensitive resin
IT1134225B (it) * 1980-11-12 1986-08-13 Stemac Spa Procedimento e mezzi per liberare carta abrasiva dalla polvere di levigatura depositatasi
JPS59169590A (ja) * 1983-03-17 1984-09-25 Toray Ind Inc 水洗い出し性感光性樹脂印刷版の洗い出し廃液の処理方法
DE3782205T2 (de) * 1986-07-23 1993-02-25 Sumitomo Heavy Industries Behandlung einer photoresistmaterialien enthaltenden abfalloesung.
GB8807380D0 (en) * 1988-03-29 1988-05-05 Gunn A Blood processing apparatus
EP0430233B1 (de) * 1989-11-30 1998-04-22 Toyo Boseki Kabushiki Kaisha Vorrichtung und Verfahren zur Entwicklung von Photopolymer-Druckplatten
US5194583A (en) * 1991-04-26 1993-03-16 Morton International, Inc. Method for neutralizing an alkaline solution of an organic resin
DE4212118A1 (de) * 1992-04-10 1993-10-14 Hoechst Ag Vorrichtung zur Aufbereitung von Sondermüll
JP3138553B2 (ja) * 1992-10-30 2001-02-26 日本ペイント株式会社 フレキソ製版工程における現像液循環方法及びその方法を実施するための装置
DE4442712C1 (de) * 1994-12-01 1996-03-14 Krause Biagosch Gmbh Vorrichtung und Verfahren zum Entwickeln von Druckplatten
US5540848A (en) * 1994-12-13 1996-07-30 Vortex Corporation Filter retainer for water purification unit

Also Published As

Publication number Publication date
DE69805477D1 (de) 2002-06-27
EP0897135A1 (de) 1999-02-17
AU7997898A (en) 1999-02-25
US6153107A (en) 2000-11-28
US6379558B1 (en) 2002-04-30
AU705780B2 (en) 1999-06-03
EP0897135B1 (de) 2002-05-22

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Legal Events

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8364 No opposition during term of opposition